2D Generation has announced that the Israel Innovation Authority has awarded the Company a grant of ILS 1.2 million (around USD$325,000), out of a project of ILS 2.4 million (around USD$650,000).
2D Generation has stated that the grant validates its technological advancements, as well as the strength of its intellectual property and market potential. The Company will use the funding to fuel the ongoing development of its novel low-temperature graphene deposition technology, enabling new possibilities for graphene applications across various industries.
2D Generation has developed a solution to enable in-situ ALD graphene deposition at low temperatures. The Company relies on a unique and patented process based on Atomic Layer Deposition (ALD) to forming graphene directly on the wafer. The process uses patented precursors and is a low-temperature process at below 280°C. The process is also said to be compatible with current manufacturing limitations (and can be applied using existing industrial processes and equipment). As part of the process, an addition of a tethering group is designed to increase adhesion to silicon oxide, metals, and other optional surfaces.