First Graphene (FGR) has provided an update of the work on the Vortex Fluidic Device (VFD) technology. First Graphene and its subsidiary 2D Fluidics are developing a more benign processing route using the Vortex Fluidic device for oxidized graphene and recently successfully transferred the technology to First Graphene’s laboratories at the Graphene Engineering and Innovation Centre in Manchester.
Work has been underway on the Vortex Fluidic device at First Graphene’s Manchester facilities, with the technology undergoing further development and optimization to identify, understand and resolve future upscaling issues.
Via its more benign processing route for graphene oxide, First Graphene and 2D Fluidics aim to provide controlled levels of surface oxygen functionality to give better and easier compatibility in aqueous and organic systems.
Currently, the Hummers method is the most used process to synthesize graphene oxide, but the technique requires strong acids and oxidants. First Graphene explained its method will not incur higher oxygen and other defect levels which result from the Hummers process.
The company’s new method also aims to enable tuning or optimizing surface oxidation levels to suit different applications.
It works by synthesizing graphene oxide from bulk graphite using aqueous hydrogen peroxide as the green oxidant. Different energy sources are then used to convert the hydrogen peroxide molecules into more active peroxide species. Irradiation promotes the dissociation of hydrogen peroxide into hydroxyl radicals which then leads to surface oxidation.
Moving forward, First Graphene will establish operating parameters to provide data for scaling the system up to commercial production. We are now reviewing end applications and, thus, exploring a number of avenues which include, but are not limited to the use in devices, testing levels of toxicity for biological applications, for water filtration membranes and incorporation in membranes for studying anti-fouling properties, Mr. McGuckin added.
