Graphene enables high-quality GaN on silicon
Graphenea demonstrated how gallium nitride (GaN) can be grown on silicon using graphene as an intermediary layer. GaN (and other semiconductors) are very appealing for applications such as LEDs, lasers and high-frequency and high-power transistors, and silicon is a great substrate for this, but it is very difficult to grown high-quality epitaxial GaN films on Si(100).
Graphene (in collaboration with MIT,Ritsumeikan University, Seoul National University and Dongguk University) found out that graphene can be used as an intermediary layer in such a structure. The hexagonal lattice of graphene has the same symmetry as that of GaN, and it can also be easily transferred to a silicon wafer. The company's method results in the best GaN(0001) layers on Si(100) demonstrated to date.