Aixtron today announced an order for one Black Magic deposition system from Purdue University’s Birck Nanotechnology Center in West Lafayette, IN, USA. The order is for a 2 inch wafer configuration system for the deposition of carbon nanomaterials and high-k oxides by atomic layer deposition (ALD). The order was received in the fourth quarter of 2009 and the system will be delivered in the second quarter of 2010.
Associate Professor Peide Ye of Purdue University comments, The Black Magic CVD/PECVD platform is vital to our ongoing advanced CMOS device characterization research projects. This first-of-a-kind dual-configuration CVD system will allow us to not only to carry out CNT and graphene deposition but also to prepare high-k oxides by ALD in-situ. Having this unique capability at Birck means that we will be able to optimise carbon/oxide-based materials for the next-generation device channels. The advantage of preparing the oxide in-situ directly after channel growth is that it potentially eliminates contamination and trapped charge, leading to cleaner channel/oxide interfaces and better device performance.
