Graphene CVD sheets - updates and market status - Page 21
Aixtron sold a CVD system for a US R&D center for graphene research
Aixtron announced today that they have received an order for a silicon carbide (SiC) chemical vapor deposition (CVD) system from a major corporate research & development center in the US (northeast US, to be exact).
The R&D center ordered a VP508GFR 1x4-inch wafer configuration Hot-Wall reactor system with additional features including a Dual Tube Hot-Wall reactor with the Aixtron patented Gas Foil Rotation® for individual wafer uniformity and high temperature capability. The deliver will be in 2Q 2011 (the order was placed in 3Q 2010).
Purdue University to get an AIXTRON deposition tool for Nanotubes and Graphene
Aixtron today announced an order for one Black Magic deposition system from Purdue University’s Birck Nanotechnology Center in West Lafayette, IN, USA. The order is for a 2 inch wafer configuration system for the deposition of carbon nanomaterials and high-k oxides by atomic layer deposition (ALD). The order was received in the fourth quarter of 2009 and the system will be delivered in the second quarter of 2010.
Associate Professor Peide Ye of Purdue University comments, The Black Magic CVD/PECVD platform is vital to our ongoing advanced CMOS device characterization research projects. This first-of-a-kind dual-configuration CVD system will allow us to not only to carry out CNT and graphene deposition but also to prepare high-k oxides by ALD in-situ. Having this unique capability at Birck means that we will be able to optimise carbon/oxide-based materials for the next-generation device channels. The advantage of preparing the oxide in-situ directly after channel growth is that it potentially eliminates contamination and trapped charge, leading to cleaner channel/oxide interfaces and better device performance.
UCSB bought a system for graphene and carbon nanotube growth from Aixtron
Aixtron announced today that it has received a purchase order for a 6" Black Magic Plasma Enhanced CVD (PECVD) system for graphene and carbon nanotube (CNT) growth from the University of California (UCSB).
This combined thermal CVD and plasma enhanced CVD tool is planned to be delivered in first quarter 2010 to Professor Kaustav Banerjee, who directs the Nanoelectronics Research Lab at UCSB. The PECVD system uses unique rapid heating and plasma technologies that is used to produce various types of nanotubes, including low temperature, multiwall, singlewall and supergrowth nanotubes.
